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oxynitride film

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  • oxynitride film — silicio oksido ir nitrido sluoksnis statusas T sritis radioelektronika atitikmenys: angl. oxynitride film vok. Oxinitridschicht, f rus. плёнка оксинитрида кремния, f pranc. film d oxynitrure, m …   Radioelektronikos terminų žodynas

  • film d'oxynitrure — silicio oksido ir nitrido sluoksnis statusas T sritis radioelektronika atitikmenys: angl. oxynitride film vok. Oxinitridschicht, f rus. плёнка оксинитрида кремния, f pranc. film d oxynitrure, m …   Radioelektronikos terminų žodynas

  • Oxinitridschicht — silicio oksido ir nitrido sluoksnis statusas T sritis radioelektronika atitikmenys: angl. oxynitride film vok. Oxinitridschicht, f rus. плёнка оксинитрида кремния, f pranc. film d oxynitrure, m …   Radioelektronikos terminų žodynas

  • silicio oksido ir nitrido sluoksnis — statusas T sritis radioelektronika atitikmenys: angl. oxynitride film vok. Oxinitridschicht, f rus. плёнка оксинитрида кремния, f pranc. film d oxynitrure, m …   Radioelektronikos terminų žodynas

  • плёнка оксинитрида кремния — silicio oksido ir nitrido sluoksnis statusas T sritis radioelektronika atitikmenys: angl. oxynitride film vok. Oxinitridschicht, f rus. плёнка оксинитрида кремния, f pranc. film d oxynitrure, m …   Radioelektronikos terminų žodynas

  • List of Star Trek materials — This is a list of fictional materials from the science fiction universe of Star Trek. Like other aspects of stories in the franchise, some were recurring plot elements from one episode or series to another. Contents 1 Metals for starship… …   Wikipedia

  • Chemical vapor deposition — DC plasma (violet) enhances the growth of carbon nanotubes in this laboratory scale PECVD apparatus. Chemical vapor deposition (CVD) is a chemical process used to produce high purity, high performance solid materials. The process is often used in …   Wikipedia

  • High-k dielectric — The term high κ dielectric refers to a material with a high dielectric constant (κ) (as compared to silicon dioxide) used in semiconductor manufacturing processes which replaces the silicon dioxide gate dielectric. The implementation of high κ… …   Wikipedia

  • Konarka Technologies — Infobox Company company name = Konarka Technologies, Inc. company company type = Private foundation = 2001 founder = location city = Lowell, Massachusetts location country = USA location = coord|42.6471|N|71.3079|W| key people = Howard Berke,… …   Wikipedia

  • Glossary of geology terms — Here is a glossary of Geological terms.A*Abyssal plain Flat or very gently sloping areas of the deep ocean basin floor. *Absolute dating the process of determining a specific date (in years or some other unit of time) for an archaeological,… …   Wikipedia

  • Ceramic materials — Ceramic Si3N4 bearing parts Ceramic materials are inorganic, non metallic materials and things made from them. They may be crystalline or partly crystalline. They are formed by the action of heat and subsequent cooling.[1] Clay was one of the… …   Wikipedia

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